The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
Mar. 26, 2014
Samsung Display Co., Ltd., Yongin, KR;
Cha-Dong Kim, Seoul, KR;
Hoon Kang, Suwon-si, KR;
Chang-Hoon Kim, Asan-si, KR;
Sang-Hyun Yun, Suwon-si, KR;
Jung-In Park, Seoul, KR;
Woo-Yong Sung, Seoul, KR;
Ki-Beom Lee, Seoul, KR;
Hi-Kuk Lee, Yongin, KR;
Jae-Hyuk Chang, Seongnam-si, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.