The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2015

Filed:

Apr. 11, 2013
Applicant:

Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

Sang Hyun Yun, Suwon-si, KR;

Cha-Dong Kim, Seoul, KR;

Jung-In Park, Seoul, KR;

Jae Hyuk Chang, Seongnam-si, KR;

Hi Kuk Lee, Yongin-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/00 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01); G02F 1/1335 (2006.01); G02F 1/1339 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2022 (2013.01); G03F 7/0007 (2013.01); Y10T 428/24851 (2015.01); G02F 1/13394 (2013.01); G02F 1/133512 (2013.01);
Abstract

The present invention relates to a method of fabricating a display device using a maskless exposure apparatus, and the display device, and more particularly, to a method of fabricating a display device by using a maskless exposure apparatus, which is capable of preventing a stain from being viewed, and the display device. An exemplary embodiment of the present invention provides a method of fabricating a display device, including: forming a first exposure region on a substrate by performing exposure while scanning the substrate with a first exposure head irradiating an exposure beam according to pattern information of a first pattern in a scanning direction; and forming a second exposure region adjacent to the first exposure region on the substrate by performing exposure while scanning the substrate with a second exposure head irradiating an exposure beam according to the pattern information of the first pattern in the scanning direction; in which an exposure boundary region between the first exposure region and the second exposure region is extended in the scanning direction, and the exposure boundary region overlaps a light blocking region.


Find Patent Forward Citations

Loading…