The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Feb. 28, 2012
Jung-in Park, Seoul, KR;
Su-yeon Sim, Changwon-si, KR;
Sang-hyun Yun, Suwon-si, KR;
Cha-dong Kim, Hwaseong-si, KR;
Hi-kuk Lee, Yongin-si, KR;
Jung-In Park, Seoul, KR;
Su-Yeon Sim, Changwon-si, KR;
Sang-Hyun Yun, Suwon-si, KR;
Cha-Dong Kim, Hwaseong-si, KR;
Hi-Kuk Lee, Yongin-si, KR;
Samsung Display Co., Ltd., , KR;
Abstract
A method of forming a photosensitive pattern on a substrate with a photosensitive layer disposed thereon may include moving at least one of the substrate and a set of micro-mirrors in a first direction, the set of micro-mirrors being disposed above the substrate and being arranged as an array, the array having a first edge extending in a second direction, the second direction being at an acute angle with respect to the first direction. The method may also include selectively turning on one or more micro-mirrors of the set of micro-mirrors according to a position of the set of micro-mirrors relative to the photosensitive layer, thereby irradiating one or more spot beams on the photosensitive layer. The photosensitive layer exposed by the spot beams is developed to form a photosensitive pattern having an edge portion extending in a third direction crossing the first and second directions.