Taichung, Taiwan

Jun Xiu Liu

This inventor holds 15 USPTO granted patents and 5 published patent applications, primarily in Semiconductor Processing. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2007-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun Xiu Liu. Retrieved from https://idiyas.com/inventor/jun-xiu-liu-99zfyv9w

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 15 

% Patents Active = 80.0

Average Co-Inventor Count = 5.3

ph-index = 4

Forward Citations = 63(Granted Patents)


Location History:

  • Hsinchu, TW (2007 - 2008)
  • Taichung, TW (2007 - 2024)

Company Filing History:


Years Active: 2007-2026

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Areas of Expertise:
Semiconductor Processing
Fluid Dynamics
High-Speed Inspection
Surface Topography
Integrated Circuits
High-Voltage Transistors
Dielectric Etch Stop
Gate Oxide Definition
Wafer Surface
Real Time Inspection
Inspection Methods
15 patents (USPTO):Explore Patents

Title: Innovations and Achievements of Inventor Jun Xiu Liu

Introduction

Jun Xiu Liu is a prominent inventor based in Taichung, Taiwan, celebrated for his contributions to the field of semiconductor technology. With a remarkable portfolio of 14 patents, Liu has made significant strides in enhancing semiconductor manufacturing processes, which are critical for modern electronics.

Latest Patents

Liu's recent inventions include two noteworthy patents that demonstrate his expertise in fluid dynamics and inspection methods for semiconductor substrates. The first patent titled "Apparatus and Methods for Determining Fluid Dynamics of Liquid Film on Wafer Surface" outlines an innovative apparatus for inspecting a semiconductor substrate. This device features a rotatable base for substrate support and a nozzle arm equipped with a laser transmitter and a light monitoring device. By transmitting a laser pulse towards the substrate and analyzing the returned signals, it accurately determines process quality based on the distance between the monitoring device and the substrate.

The second patent, "Nozzle Having Real Time Inspection Functions," describes a method for manufacturing semiconductor devices. This method involves a nozzle that dispenses fluid onto the workpiece's surface while simultaneously emitting light towards that surface. The reflected light is then analyzed to assess the status of the manufacturing process effectively.

Career Highlights

Liu's career has been marked by his dedication to advancing semiconductor technology. His innovative patents reflect a strong commitment to improving inspection methods and fluid dynamics, critical components in semiconductor manufacturing. His technical knowledge and inventive spirit have positioned him as a key contributor within the industry.

Collaborations

Throughout his career, Jun Xiu Liu has collaborated with fellow engineers and researchers, including his coworkers Kai-Lin Chuang and Chi-Hsuen Chang. These partnerships have fostered a dynamic environment of creativity and knowledge sharing, leading to groundbreaking advancements in semiconductor technology.

Conclusion

Jun Xiu Liu continues to push the boundaries of innovation in semiconductor manufacturing through his inventive contributions and collaborations. His latest patents not only showcase his technical skills but also pave the way for enhanced manufacturing processes in the dynamic field of electronics. As technology evolves, Liu's work remains integral to shaping the future of semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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