Company Filing History:

27 out of 13,684

Applied Materials, Inc.

patents

1 out of 34

Comet Technologies Usa, Inc.

patents

Years Active: 2007-2020

Loading Chart...

28 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10648074 - Physical vapor deposition with isotropic neutral and non-isotropic ion velocity distribution at the wafer surface (2020-05-12),

2. 10400328 - Physical vapor deposition system with a source of isotropic ion velocity distribution at the wafer surface (2019-09-03),

3. 9856558 - Physical vapor deposition method with a source of isotropic ion velocity distribution at the wafer surface (2018-01-02),

4. 9593411 - Physical vapor deposition chamber with capacitive tuning at wafer support (2017-03-14),

5. 9017533 - Apparatus for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning (2015-04-28),

6. 8920611 - Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning (2014-12-30),

7. 8846451 - Methods for depositing metal in high aspect ratio features (2014-09-30),

8. 8563428 - Methods for depositing metal in high aspect ratio features (2013-10-22),

9. 8562798 - Physical vapor deposition plasma reactor with RF source power applied to the target and having a magnetron (2013-10-22),

10. 8512526 - Method of performing physical vapor deposition with RF plasma source power applied to the target using a magnetron (2013-08-20),

11. 8491759 - RF impedance matching network with secondary frequency and sub-harmonic variant (2013-07-23),

12. 8435379 - Substrate cleaning chamber and cleaning and conditioning methods (2013-05-07),

13. 8123969 - Process for removing high stressed film using LF or HF bias power and capacitively coupled VHF source power with enhanced residue capture (2012-02-28),

14. 8070925 - Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter target (2011-12-06),

15. 8062484 - Method for plasma-enhanced physical vapor deposition of copper with RF source power applied to the target (2011-11-22),

Title: Innovations in Physical Vapor Deposition by John Pipitone

Introduction

John Pipitone is an accomplished inventor located in Livermore, CA, with an impressive portfolio encompassing 28 patents. His innovative work primarily focuses on advancements in physical vapor deposition (PVD) technologies, which have significant implications in various industries.

Latest Patents

Among his latest patents, two noteworthy inventions stand out:

1. **Physical vapor deposition with isotropic neutral and non-isotropic ion velocity distribution at the wafer surface** - This invention involves a plasma-enhanced physical vapor deposition process where a metal target is positioned to face the workpiece across a gap smaller than the workpiece diameter. A carrier gas is introduced into the chamber, ensuring that the gas pressure remains above a threshold where the mean free path is less than 5% of the gap. RF plasma source power from a VHF generator is applied to create a capacitively coupled plasma at the target, utilizing a frequency exceeding 30 MHz. The plasma is effectively extended across the gap to the workpiece using a first VHF ground return path.

2. **Physical vapor deposition system with a source of isotropic ion velocity distribution at the wafer surface** - Similar to his first patent, this invention outlines a system for plasma-enhanced physical vapor deposition. The setup is designed to maintain specific gas pressure conditions and leverage VHF generator technology to ensure effective plasma generation and delivery to the workpiece.

Career Highlights

Throughout his career, John Pipitone has made significant contributions to the field of physical vapor deposition. He has worked at reputable companies, including Applied Materials, Inc. and Comet Technologies USA, Inc., where he has honed his expertise and developed pivotal technologies that have advanced manufacturing processes.

Collaborations

John has collaborated with several talented individuals in his field, including Karl M. Brown and Vineet Haresh Mehta. These collaborations have fostered a creative environment that has resulted in numerous innovations and enhancements in PVD technologies.

Conclusion

In conclusion, John Pipitone stands out as a significant figure in the realm of physical vapor deposition, with a plethora of patents showcasing his innovative spirit. His contributions not only underline his expertise but also pave the way for future advancements in the industry, influencing countless applications across various sectors.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com

Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.