The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Jul. 15, 2008
John C. Forster, San Francisco, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
John A. Pipitone, Livermore, CA (US);
Xianmin Tang, San Jose, CA (US);
Rongjun Wang, Cupertino, CA (US);
John C. Forster, San Francisco, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
John A. Pipitone, Livermore, CA (US);
Xianmin Tang, San Jose, CA (US);
Rongjun Wang, Cupertino, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
In a physical vapor deposition plasma reactor, a multi-frequency impedance controller is coupled between RF ground and one of (a) the bias electrode, (b) the sputter target, the controller providing adjustable impedances at a first set of frequencies, said first set of frequencies including a first set of frequencies to be blocked and a first set of frequencies to be admitted. The first multi-frequency impedance controller includes a set of band pass filters connected in parallel and tuned to said first set of frequencies to be admitted, and a set of notch filters connected in series and tuned to said first set of frequencies to be blocked.