The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2013
Filed:
May. 08, 2007
Vineet Mehta, Mountain View, CA (US);
Karl Brown, Mountain View, CA (US);
John A. Pipitone, Livermore, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Steven C. Shannon, San Mateo, CA (US);
Keith A. Miller, Sunnyvale, CA (US);
Vijay D. Parkhe, San Jose, CA (US);
Vineet Mehta, Mountain View, CA (US);
Karl Brown, Mountain View, CA (US);
John A. Pipitone, Livermore, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Steven C. Shannon, San Mateo, CA (US);
Keith A. Miller, Sunnyvale, CA (US);
Vijay D. Parkhe, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A substrate cleaning chamber includes a contoured ceiling electrode having an arcuate surface that faces a substrate support and has a variable cross-sectional thickness to vary the gap size between the arcuate surface and the substrate support to provide a varying plasma density across the substrate support. A dielectric ring for the cleaning chamber comprises a base, a ridge, and a radially inward ledge that covers the peripheral lip of the substrate support. A base shield comprises a circular disc having at least one perimeter wall. Cleaning and conditioning processes for the cleaning chamber are also described.