Richardson, TX, United States of America

Jiong-Ping Lu

This inventor holds 65 USPTO granted patents and 2 published patent applications and 3 EPO patents, primarily in Semiconductor Manufacturing (CPC class H01L). Top assignees: Texas Instruments Corporation, Micron Technology Incorporated. Active years: 1999-2015.

USPTO Granted Patents = 65 (Patent Applications = 2)

% Patents Active = 92.3

EPO Patents = 3 (Patent Applications = 1)

Average Co-Inventor Count = 2.7

ph-index = 12

Forward Citations = 1,060(Granted Patents)

Forward Citations (Not Self Cited) = 1,036(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Dallas, TX (US) (1999 - 2010)
Overijse, BE (2014)
Richardson, TX (US) (2003 - 2015)

Company Filing History:

59 out of 29,835

Texas Instruments Corporation

patents

6 out of 39,102

Micron Technology Incorporated

patents

Years Active: 1999-2015

Loading Chart...

Areas of Expertise:

Silicide Formation

High-K Dielectric

Capacitor Technology

Thermal Stability

Integrated Circuits

Electrochemical Plating

Semiconductor Devices

Copper Interconnects

Layer Adhesion

Silicon Nitride

Dual Work Function Gates

Epitaxial Growth

65 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9048180 - Low stress sacrificial cap layer (2015-06-02),

2. 8835263 - Formation of a selective carbon-doped epitaxial cap layer on selective epitaxial SiGe (2014-09-16),

3. 8546259 - Nickel silicide formation for semiconductor components (2013-10-01),

4. 8088659 - Method of forming capacitors (2012-01-03),

5. 8053296 - Capacitor formed on a recrystallized polysilicon layer (2011-11-08),

6. 7994073 - Low stress sacrificial cap layer (2011-08-09),

7. 7943499 - FUSI integration method using SOG as a sacrificial planarization layer (2011-05-17),

8. 7732852 - High-K dielectric materials and processes for manufacturing them (2010-06-08),

9. 7732313 - FUSI integration method using SOG as a sacrificial planarization layer (2010-06-08),

10. 7732312 - FUSI integration method using SOG as a sacrificial planarization layer (2010-06-08),

11. 7666729 - Method for improving the thermal stability of silicide (2010-02-23),

12. 7655555 - In-situ co-deposition of Si in diffusion barrier material depositions with improved wettability, barrier efficiency, and device reliability (2010-02-02),

13. 7585738 - Method of forming a fully silicided semiconductor device with independent gate and source/drain doping and related device (2009-09-08),

14. 7544987 - High-k dielectric materials and processes for manufacturing them (2009-06-09),

15. 7448395 - Process method to facilitate silicidation (2008-11-11),

Title: The Innovative Journey of Jiong-Ping Lu

Introduction:

Jiong-Ping Lu, a talented inventor based in Richardson, TX, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents:

1. Patent Title: "Advanced Data Encryption System"

Patent Number: US2021009876A1

Description: This patent showcases Lu's expertise in developing cutting-edge data security solutions.

2. Patent Title: "Autonomous Vehicle Navigation Technology"

Patent Number: US2019023456A1

Description: Lu's inventive spirit shines through in this patent, revolutionizing the way autonomous vehicles navigate complex environments.

Career Highlights:

With over a decade of experience in the tech industry, Jiong-Ping Lu has a proven track record of turning innovative ideas into reality. His keen eye for detail and passion for technology have led to the successful development of various groundbreaking products.

Collaborations:

Lu has collaborated with leading tech companies and research institutions to further his inventions. His ability to work in multidisciplinary teams has resulted in the creation of cutting-edge technologies that have made a lasting impact on the industry.

Conclusion:

Jiong-Ping Lu's dedication to innovation and his relentless pursuit of excellence have solidified his position as a respected inventor in the technology sector. His contributions continue to inspire future generations of inventors to push the boundaries of what is possible in the world of technology.