IDiyas

For the Inventor, By the Inventor

Gunpo-si, South Korea

Jin Kuk Lee

USPTO Granted Patents = 15

Average Co-Inventor Count = 4.9

ph-index = 6

Forward Citations = 92(Granted Patents)


Location History:

  • Kyoungki-do, KR (2008)
  • Kyeonggi-do, KR (2009 - 2011)
  • Uiwang-si, KR (2012)
  • Gunpo-si, KR (2010 - 2013)
  • Gyeonggi-Do, KR (2010 - 2021)

Company Filing History:

goldMedal13 out of 787 
 
Cheil Industries Inc.
 patents
silverMedal1 out of 3 
 
Cheil Industrial, Inc.
 patents
bronzeMedal1 out of 6 
 
Lbsemicon Co., Ltd.
 patents

Years Active: 2008-2021

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15 patents (USPTO):Explore Patents
1. 10937751 - Bump structure manufacturing method (2021-03-02),
2. 8445187 - Hardmask composition having antireflective properties and method of patterning material on substrate using the same (2013-05-21),
3. 8420289 - Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods (2013-04-16),
4. 8263321 - Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer (2012-09-11),
5. 8153349 - Polymer composition, hardmask composition having antireflective properties, and associated methods (2012-04-10),
6. 7981594 - Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same (2011-07-19),
7. 7879526 - Hardmask compositions for resist underlayer films (2011-02-01),
8. 7862990 - Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer (2011-01-04),
9. 7829638 - Antireflective hardmask composition and methods for using same (2010-11-09),
10. 7659051 - Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer (2010-02-09),
11. 7655386 - Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device (2010-02-02),
12. 7629260 - Organosilane hardmask compositions and methods of producing semiconductor devices using the same (2009-12-08),
13. 7514199 - Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same (2009-04-07),
14. 7405029 - Antireflective hardmask composition and methods for using same (2008-07-29),
15. 7378217 - Antireflective hardmask composition and methods for using same (2008-05-27),

Title: Innovator Spotlight: Jin Kuk Lee

Introduction

Jin Kuk Lee, a prolific inventor based in Gunpo-si, South Korea, has made significant contributions to the field of manufacturing technology with a total of 15 patents to his name. His innovative work primarily focuses on methods and compositions that enhance semiconductor manufacturing processes, showcasing his commitment to advancing technological capabilities.

Latest Patents

Jin Kuk Lee's latest patents illustrate his expertise in manufacturing techniques. One notable patent is the "Bump Structure Manufacturing Method," which details a comprehensive process for creating bump structures on semiconductor wafers. This method includes several key steps, such as preparing wafers with die pads and under bump metal (UBM) layers, attaching backgrinding films, grinding, and curing flexible material layers. Each step is meticulously designed to ensure precision and efficiency in chip production.

Additionally, he has developed a "Hardmask Composition Having Antireflective Properties," which employs an organic solvent combined with aromatic ring-containing polymers. This innovative composition serves as a critical element in patterning materials on substrates, addressing specific challenges in semiconductor fabrication.

Career Highlights

Jin Kuk Lee has held positions at reputable companies in the industry, including Cheil Industries Inc. and Cheil Industrial, Inc. His tenure at these institutions has afforded him valuable insights and expertise in the evolving landscape of semiconductor technology, further enriching his inventive portfolio.

Collaborations

Throughout his career, Jin has collaborated with notable professionals, including Dong Seon Uh and Chang Il Oh. These partnerships have undoubtedly contributed to the innovation and success of his projects, highlighting the importance of teamwork in advancing technological solutions.

Conclusion

In summary, Jin Kuk Lee stands out as a visionary inventor in semiconductor manufacturing, evidenced by his impressive array of patents and contributions to the field. His work is a testament to the impact of innovation on technology, inspiring future generations of inventors to pursue groundbreaking ideas and solutions. His journey exemplifies how dedication and collaboration can lead to advancements in manufacturing technology.

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