The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Feb. 06, 2006
Applicants:
Dong Seon Uh, Seoul, KR;
Chang IL OH, Gyeonggi-Do, KR;
DO Hyeon Kim, Gyeonggi-Do, KR;
Jin Kuk Lee, Gyeonggi-Do, KR;
Irina Nam, Gyeonggi-Do, KR;
Inventors:
Dong Seon Uh, Seoul, KR;
Chang Il Oh, Gyeonggi-Do, KR;
Do Hyeon Kim, Gyeonggi-Do, KR;
Jin Kuk Lee, Gyeonggi-Do, KR;
Irina Nam, Gyeonggi-Do, KR;
Assignee:
Cheil Industries, Inc., , KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
Abstract
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided.
Uh, Dong. (2010). Antireflective hardmask composition and methods for using same (U.S. Patent No. 7829638). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7829638
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile