Location History:
- Kyoungki-do, KR (2008 - 2009)
- Kyeonggi-Do, KR (2009 - 2011)
- Gunpo-si, KR (2012)
- Gyeonggi-Do, KR (2010 - 2014)
Company Filing History:
Years Active: 2008-2014
Title: Do Hyeon Kim: Innovator in Hardmask Composition Technologies
Introduction
Do Hyeon Kim is a prominent inventor based in Kyoungki-do, South Korea. He has made significant contributions to the field of materials science, particularly in the development of hardmask compositions used in semiconductor processing. With a total of 8 patents to his name, Kim's work has been influential in advancing technology in this area.
Latest Patents
Among his latest patents, Kim has developed a hardmask composition for processing a resist underlayer film. This composition includes a solvent and an organosilane polymer, which is represented by a specific formula. The formula outlines the relationships between various components, ensuring optimal performance in semiconductor applications. Another notable patent involves a hardmask composition that features a solvent and an organosilicon copolymer, also defined by a unique formula. These innovations are crucial for enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Career Highlights
Throughout his career, Do Hyeon Kim has worked with notable companies such as Cheil Industries Inc. and Cheil Industrial, Inc. His experience in these organizations has allowed him to refine his expertise in materials science and patent development. His contributions have not only advanced his career but have also significantly impacted the industry.
Collaborations
Kim has collaborated with esteemed colleagues, including Dong Seon Uh and Chang Il Oh. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Do Hyeon Kim's work in hardmask compositions exemplifies the spirit of innovation in the semiconductor industry. His patents and collaborations highlight his commitment to advancing technology and improving manufacturing processes. His contributions will continue to influence the field for years to come.