The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2009
Filed:
Aug. 22, 2006
Dong Seon Uh, Seoul-si, KR;
Chang IL OH, Kyeonggi-Do, KR;
DO Hyeon Kim, Kyeonggi-Do, KR;
Hui Chan Yun, Kyeongsangnam-do, KR;
Jin Kuk Lee, Kyeonggi-Do, KR;
Irina Nam, Kyeonggi-do, KR;
Jong Seob Kim, Daejeon-si, KR;
Dong Seon Uh, Seoul-si, KR;
Chang Il Oh, Kyeonggi-Do, KR;
Do Hyeon Kim, Kyeonggi-Do, KR;
Hui Chan Yun, Kyeongsangnam-do, KR;
Jin Kuk Lee, Kyeonggi-Do, KR;
Irina Nam, Kyeonggi-do, KR;
Jong Seob Kim, Daejeon-si, KR;
Cheil Industries, Inc., , KR;
Abstract
Provided herein are hardmask compositions for resist underlayer films, wherein in some embodiments, the hardmask compositions include Further provided herein are methods for producing a semiconductor integrated circuit device using a hardmask composition according to an embodiment of the present invention. In addition, provided herein are semiconductor integrated circuit devices produced by a method embodiment of the invention.