IDiyas

For the Inventor, By the Inventor

Daejeon, South Korea

Jong Seob Kim

USPTO Granted Patents = 24


Average Co-Inventor Count = 5.7

ph-index = 8

Forward Citations = 140(Granted Patents)


Location History:

  • Taejon-Shi, KR (2005)
  • Daejeonkwangyeok-si, KR (2008 - 2010)
  • Daegukwangyeok-si, KR (2010)
  • Daejeon-si, KR (2009 - 2013)
  • Uiwang-si, KR (2012 - 2013)
  • Daejeon, KR (2005 - 2014)

Company Filing History:

goldMedal21 out of 787 
 
Cheil Industries Inc.
 patents
silverMedal3 out of 7,636 
 
Samsung Sdi Co., Inc.
 patents
bronzeMedal2 out of 7 
 
Ecopro Co. Ltd.
 patents
4. 1 out of 3 
 
Cheil Industrial, Inc.
 patents
where one patent can have more than one assignee

Years Active: 2005-2014

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24 patents (USPTO):Explore Patents
1. 8916329 - Hardmask composition and associated methods (2014-12-23),
2. 8524851 - Silicon-based hardmask composition and process of producing semiconductor integrated circuit device using the same (2013-09-03),
3. 8445187 - Hardmask composition having antireflective properties and method of patterning material on substrate using the same (2013-05-21),
4. 8383737 - Compound for gap-filling of semiconductor device and coating composition using the same (2013-02-26),
5. 8299197 - Organosilane polymer with improved gap-filling property for semiconductor device and coating composition using the same (2012-10-30),
6. 8273519 - Hardmask composition and associated methods (2012-09-25),
7. 8263321 - Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer (2012-09-11),
8. 8153349 - Polymer composition, hardmask composition having antireflective properties, and associated methods (2012-04-10),
9. 7981594 - Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same (2011-07-19),
10. 7947795 - Polymer for filling gaps in semiconductor substrate and coating composition using the same (2011-05-24),
11. 7879526 - Hardmask compositions for resist underlayer films (2011-02-01),
12. 7862990 - Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer (2011-01-04),
13. 7829219 - Cathode for lithium secondary batteries having improved coating properties and lithium secondary batteries using the same (2010-11-09),
14. 7659051 - Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer (2010-02-09),
15. 7655386 - Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device (2010-02-02),

Title: Jong Seob Kim: A Pioneer in Semiconductor Hardmask Technologies

Introduction: Jong Seob Kim, based in Daejeon, South Korea, is an accomplished inventor with an impressive portfolio of 24 patents. His work primarily focuses on advanced materials and methodologies for semiconductor processing, which play a crucial role in modern electronics.

Latest Patents: Among his notable recent inventions is a hardmask composition that incorporates a solvent and an organosilane polymer, particularly designed to enhance the processing of resist underlayer films. This innovative composition is represented by a specific formula where R is either methyl or ethyl, and R' is a cyclic or acyclic alkyl group. The parameters x, y, and z in the formula are strategically defined to optimize performance in semiconductor applications. Another significant patent involves a silicon-based hardmask composition and the processes for producing integrated circuit devices, emphasizing the utility of organosilane polymers in achieving superior results.

Career Highlights: Jong Seob Kim has had a dynamic career, contributing significantly to the field of semiconductor technology. His professional journey includes tenures at reputable companies such as Cheil Industries Inc. and Samsung SDI Co., Inc., where he has harnessed his expertise to push the boundaries of innovation in semiconductor materials.

Collaborations: Throughout his career, Kim has collaborated with fellow innovators such as Dong Seon Uh and Jin Kuk Lee. These partnerships have led to advancements in hardmask technologies and have fostered a collaborative spirit that is essential in the fast-paced world of technological innovation.

Conclusion: Jong Seob Kim exemplifies the spirit of innovation with his extensive patent portfolio and contributions to semiconductor technology. His work continues to influence the industry, paving the way for new developments that enhance manufacturing processes and improve device performance. His commitment to advancing hardmask compositions and methods showcases the importance of inventors in shaping the future of technology.

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