The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 2010

Filed:

Dec. 31, 2007
Applicants:

Kyong Ho Yoon, Daejeon Kwangyeok-si, KR;

Jong Seob Kim, Daejeon Kwangyeok-si, KR;

Dong Seon Uh, Seoul, KR;

Chang IL OH, Seongnam-si, KR;

Kyung Hee Hyung, Sungnam-si, KR;

Min Soo Kim, Kwangyeok-si, KR;

Jin Kuk Lee, Gunpo-si, KR;

Inventors:

Kyong Ho Yoon, Daejeon Kwangyeok-si, KR;

Jong Seob Kim, Daejeon Kwangyeok-si, KR;

Dong Seon Uh, Seoul, KR;

Chang Il Oh, Seongnam-si, KR;

Kyung Hee Hyung, Sungnam-si, KR;

Min Soo Kim, Kwangyeok-si, KR;

Jin Kuk Lee, Gunpo-si, KR;

Assignee:

Cheil Industries, Inc., Gumi-si, Gyeongsangbuk-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/11 (2006.01); C08G 61/00 (2006.01); C08G 10/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A naphthalene-backbone polymer represented by Formula 1: wherein n and m are independently at least 1 and less than about 190, Ris a hydrogen, a hydroxyl, a hydrocarbon group of about 10 carbons or less, or a halogen, Ris methylene or includes an aryl linking group, Ris a conjugated diene group, and Ris an unsaturated dienophile group.


Find Patent Forward Citations

Yoon, Kyong. (2010). Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer (U.S. Patent No. 7659051). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7659051

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…