logo

For the Inventor, By the Inventor

DaeJeon, South Korea

Kyong Ho Yoon

This inventor holds 8 USPTO granted patents and 1 published patent application. Top assignee: Cheil Industries Inc.. Active years: 2010-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyong Ho Yoon. Retrieved from https://idiyas.com/inventor/kyong-ho-yoon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8 

% Patents Active = 100.0

Average Co-Inventor Count = 7.1

ph-index = 5

Forward Citations = 61(Granted Patents)


Location History:

  • Daejeon Kwangyeok-si, KR (2010)
  • Uiwang-si, KR (2012)
  • Daejeon-si, KR (2011 - 2013)
  • Daejeon, KR (2013)

Company Filing History:

goldMedal8 out of 787 
 
Cheil Industries Inc.
 patents

Years Active: 2010-2013

Loading Chart...
8 patents (USPTO):Explore Patents
1. 8445187 - Hardmask composition having antireflective properties and method of patterning material on substrate using the same (2013-05-21),
2. 8420289 - Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods (2013-04-16),
3. 8263321 - Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer (2012-09-11),
4. 8153349 - Polymer composition, hardmask composition having antireflective properties, and associated methods (2012-04-10),
5. 7981594 - Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same (2011-07-19),
6. 7862990 - Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer (2011-01-04),
7. 7659051 - Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer (2010-02-09),
8. 7655386 - Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device (2010-02-02),

Title: Kyong Ho Yoon: Innovator in Hardmask Technologies

Introduction

Kyong Ho Yoon is a prominent inventor based in Daejeon-si, South Korea, known for his significant contributions to material science. With a total of eight patents to his name, his work focuses on developing advanced hardmask compositions that have notable applications in semiconductor manufacturing and other high-tech industries.

Latest Patents

Among his latest patents, Yoon has developed a hardmask composition that features antireflective properties. This innovative composition includes an organic solvent and incorporates one or more aromatic ring-containing polymers, represented by specific chemical formulae. Additionally, he has patented a method for patterning material on a substrate, further enhancing the functionality of the hardmask composition. His research into aromatic ring-containing polymers and polymer mixtures has paved the way for more efficient and effective antireflective hardmask compositions.

Career Highlights

Kyong Ho Yoon is currently affiliated with Cheil Industries Inc., a leading company in the field of materials and chemicals. His work at Cheil has contributed to advancements in technology that are crucial for the fabrication of electronic devices. Yoon's expertise in material sciences, combined with his innovative approach, has made him a respected figure in his field.

Collaborations

Throughout his career, Yoon has collaborated with several notable colleagues, including Min Soo Kim and Jin Kuk Lee. These collaborative efforts have been instrumental in advancing their shared research endeavors, leading to groundbreaking developments in hardmask technologies.

Conclusion

Kyong Ho Yoon's contributions to the field of hardmask compositions are essential for the advancement of semiconductor technologies. His innovative patented solutions are not only a testament to his ingenuity but also highlight the importance of collaboration in achieving remarkable scientific breakthroughs. As technology continues to evolve, Yoon's work will undoubtedly play a pivotal role in shaping future innovations in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…