Growing community of inventors

Daejeon-si, South Korea

Kyong Ho Yoon

Average Co-Inventor Count = 7.12

ph-index = 5

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 61

Kyong Ho YoonJin Kuk Lee (8 patents)Kyong Ho YoonMin Soo Kim (8 patents)Kyong Ho YoonDong Seon Uh (7 patents)Kyong Ho YoonJong Seob Kim (7 patents)Kyong Ho YoonChang Il Oh (7 patents)Kyong Ho YoonKyung Hee Hyung (5 patents)Kyong Ho YoonHwan Sung Cheon (4 patents)Kyong Ho YoonIrina Nam (1 patent)Kyong Ho YoonJong-Seob Kim (1 patent)Kyong Ho YoonJee Yun Song (1 patent)Kyong Ho YoonNataliya Tokareva (1 patent)Kyong Ho YoonKyong Ho Yoon (8 patents)Jin Kuk LeeJin Kuk Lee (15 patents)Min Soo KimMin Soo Kim (8 patents)Dong Seon UhDong Seon Uh (34 patents)Jong Seob KimJong Seob Kim (24 patents)Chang Il OhChang Il Oh (14 patents)Kyung Hee HyungKyung Hee Hyung (5 patents)Hwan Sung CheonHwan Sung Cheon (14 patents)Irina NamIrina Nam (21 patents)Jong-Seob KimJong-Seob Kim (12 patents)Jee Yun SongJee Yun Song (1 patent)Nataliya TokarevaNataliya Tokareva (1 patent)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Cheil Industries Inc. (8 from 787 patents)


8 patents:

1. 8445187 - Hardmask composition having antireflective properties and method of patterning material on substrate using the same

2. 8420289 - Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods

3. 8263321 - Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer

4. 8153349 - Polymer composition, hardmask composition having antireflective properties, and associated methods

5. 7981594 - Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same

6. 7862990 - Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer

7. 7659051 - Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer

8. 7655386 - Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device

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as of
12/5/2025
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