The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2013

Filed:

Oct. 01, 2009
Applicants:

Min Soo Kim, Incheon, KR;

Dong Seon Uh, Seoul, KR;

Chang IL OH, Gyeonggi-do, KR;

Kyong Ho Yoon, Daejeon, KR;

Kyung Hee Hyung, Gteonggi-do, KR;

Jin Kuk Lee, Gyeonggi-do, KR;

Jong-seob Kim, Daejeon, KR;

Hwan Sung Cheon, Seoul, KR;

Irina Nam, Gyeonggi-do, KR;

Nataliya Tokareva, Gyeonggi-do, KR;

Inventors:

Min Soo Kim, Incheon, KR;

Dong Seon Uh, Seoul, KR;

Chang Il Oh, Gyeonggi-do, KR;

Kyong Ho Yoon, Daejeon, KR;

Kyung Hee Hyung, Gteonggi-do, KR;

Jin Kuk Lee, Gyeonggi-do, KR;

Jong-Seob Kim, Daejeon, KR;

Hwan Sung Cheon, Seoul, KR;

Irina Nam, Gyeonggi-do, KR;

Nataliya Tokareva, Gyeonggi-do, KR;

Assignee:

Cheil Industries, Inc., Gumi-si, Gyeongsangbuk-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/40 (2006.01); G03F 7/11 (2006.01); G03F 7/028 (2006.01);
U.S. Cl.
CPC ...
Abstract

An aromatic ring-containing polymer, a polymer mixture, an antireflective hardmask composition, and a method for patterning a material on a substrate, the aromatic ring-containing polymer including at least one aromatic ring-containing polymer represented by Formulae 1, 2, or 3.


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