The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2014
Filed:
Feb. 06, 2009
Sang Kyun Kim, Gyeonggi-do, KR;
Sang Hak Lim, Incheon, KR;
MI Young Kim, Gyeonggi-do, KR;
Sang Ran Koh, Gyeonggi-do, KR;
Hui Chan Yun, Ulsan, KR;
DO Hyeon Kim, Gyeonggi-do, KR;
Dong Seon Uh, Seoul, KR;
Jong Seob Kim, Daejeon, KR;
Sang Kyun Kim, Gyeonggi-do, KR;
Sang Hak Lim, Incheon, KR;
Mi Young Kim, Gyeonggi-do, KR;
Sang Ran Koh, Gyeonggi-do, KR;
Hui Chan Yun, Ulsan, KR;
Do Hyeon Kim, Gyeonggi-do, KR;
Dong Seon Uh, Seoul, KR;
Jong Seob Kim, Daejeon, KR;
Cheil Industries, Inc., Gumi-si, Gyeongsangbuk-do, KR;
Abstract
A hardmask composition for processing a resist underlayer film includes a solvent and an organosilane polymer, wherein the organosilane polymer is represented by Formula 6: In Formula 6, R is methyl or ethyl, R' is substituted or unsubstituted cyclic or acyclic alkyl, Ar is an aromatic ring-containing functional group, x, y and z satisfy the relations x+y=4, 0.4≦x≦4, 0≦y≦3.6, and 4×10≦z≦1, and n is from about 3 to about 500.