The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2008
Filed:
Jan. 04, 2006
Applicants:
Chang IL OH, Kyoungki-do, KR;
Dong Seon Uh, Seoul, KR;
DO Hyeon Kim, Kyoungki-do, KR;
Jin Kuk Lee, Kyoungki-do, KR;
Irina Nam, Kyoungki-do, KR;
Hui Chan Yun, Daegukwangyeok-si, KR;
Jong Seob Kim, Daejeonkwangyeok-si, KR;
Inventors:
Chang Il Oh, Kyoungki-do, KR;
Dong Seon Uh, Seoul, KR;
Do Hyeon Kim, Kyoungki-do, KR;
Jin Kuk Lee, Kyoungki-do, KR;
Irina Nam, Kyoungki-do, KR;
Hui Chan Yun, Daegukwangyeok-si, KR;
Jong Seob Kim, Daejeonkwangyeok-si, KR;
Assignee:
Cheil Industries, Inc., , KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/73 (2006.01); G03C 1/76 (2006.01); G03F 7/095 (2006.01);
U.S. Cl.
CPC ...
Abstract
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include: wherein