Beijing, China

Jiewen Fan

USPTO Granted Patents = 17 

Average Co-Inventor Count = 6.1

ph-index = 3

Forward Citations = 41(Granted Patents)


Company Filing History:


Years Active: 2013-2016

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17 patents (USPTO):

Title: Innovative Contributions of Jiewen Fan

Introduction

Jiewen Fan, a prominent inventor based in Beijing, CN, has made significant strides in the field of semiconductor technology. With 17 patents to his name, he has established himself as a leader in innovation and invention in the area of field effect transistors and integrated circuits.

Latest Patents

Among his most recent inventions, Jiewen Fan has developed an integration method for a vertical nanowire transistor. This innovative method combines selective epitaxy and replacement gate techniques on the sidewall, allowing for accurate control over the size and shape of the channel, which enhances device performance by avoiding etching damage commonly encountered with traditional methods.

Another notable invention is his method for fabricating FinFET devices with separated double gates on bulk silicon. This process is designed to be compatible with conventional silicon-based large-scale integrated circuit manufacturing technologies, making it a simple and cost-effective solution. The method reduces power consumption and effectively suppresses the short channel effect, thus presenting a significant advancement in FinFET technology.

Career Highlights

Jiewen Fan's career is marked by his association with Peking University, where he continues to drive research and development in innovative semiconductor technologies. His contributions have been instrumental in the evolution of CMOS ultra-large scale integrated circuits, as well as enhancing the performance and efficiency of field effect transistors.

Collaborations

Throughout his career, Jiewen has collaborated with talented colleagues, including Ru Huang and Runsheng Wang. These partnerships have fostered an environment of innovation and creativity, allowing them to push the boundaries of technology and develop groundbreaking solutions in the semiconductor field.

Conclusion

In conclusion, Jiewen Fan stands out as an influential figure in the realm of semiconductor innovations. With a solid foundation of patents and continuous contributions to the field, his work is shaping the future of integrated circuit technology, paving the way for more efficient and effective semiconductor devices.

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