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For the Inventor, By the Inventor

Chungcheongnam-do, South Korea

Jae-Bong Lim

This inventor holds 10 USPTO granted patents and 1 published patent application. Top assignees: Rohm and Haas Electronic Materials Korea Ltd., Rohm & Haas Electronic Materials LLC, Dow Global Technolgoies LLC. Active years: 2016-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jae-Bong Lim. Retrieved from https://idiyas.com/inventor/jae-bong-lim-zmh9ehy3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 10 

% Patents Active = 100.0

Average Co-Inventor Count = 5.9

ph-index = 2

Forward Citations = 5(Granted Patents)


Location History:

  • Chung-Nam, KR (2016 - 2022)
  • Cheonan-si, KR (2022)
  • Chungcheongnam-Do, KR (2020 - 2023)

Company Filing History:

goldMedal10 out of 150 
 
Rohm and Haas Electronic Materials Korea Ltd.
 patents
silverMedal3 out of 697 
 
Rohm & Haas Electronic Materials LLC
 patents
bronzeMedal1 out of 4,813 
 
Dow Global Technolgoies LLC
 patents
where one patent can have more than one assignee

Years Active: 2016-2025

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10 patents (USPTO):Explore Patents
1. 12242193 - Coating compositions for use with an overcoated photoresist (2025-03-04),
2. 11822248 - Coating compositions for use with an overcoated photoresist (2023-11-21),
3. 11493845 - Organic bottom antireflective coating composition for nanolithography (2022-11-08),
4. 11448964 - Coating compositions for use with an overcoated photoresist (2022-09-20),
5. 11269252 - Method for forming pattern using antireflective coating composition including photoacid generator (2022-03-08),
6. 11262656 - Coating compositions for use with an overcoated photoresist (2022-03-01),
7. 11092894 - Method for forming pattern using anti-reflective coating composition comprising photoacid generator (2021-08-17),
8. 10527942 - Coating compositions for use with an overcoated photoresist (2020-01-07),
9. 9558987 - Gap-fill methods (2017-01-31),
10. 9324604 - Gap-fill methods (2016-04-26),

Title: Jae-Bong Lim: Innovator in Coating Compositions

Introduction

Jae-Bong Lim is a prominent inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of coating compositions, particularly in the development of organic coating materials used in photoresist applications. With a total of 10 patents to his name, Lim's work has had a substantial impact on the electronics industry.

Latest Patents

Among his latest patents, Lim has developed innovative coating compositions designed for use with overcoated photoresists. These organic coating compositions, especially antireflective coatings, include a crosslinker component characterized by a specific structural formula. This advancement enhances the performance and efficiency of photoresist materials in various applications.

Career Highlights

Throughout his career, Jae-Bong Lim has worked with notable companies, including Rohm and Haas Electronic Materials Korea Ltd. and Rohm & Haas Electronic Materials LLC. His experience in these organizations has allowed him to refine his expertise in coating technologies and contribute to cutting-edge research and development.

Collaborations

Lim has collaborated with several talented individuals in his field, including Jae Hwan Sim and Jung Kyu Jo. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Jae-Bong Lim's contributions to the field of coating compositions exemplify his dedication to innovation and excellence. His patents and collaborations continue to influence advancements in the electronics industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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