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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10527942 B1

PDFFull Text
Date of Patent:
Jan. 07, 2020

Filed:

Nov. 29, 2016

Coating compositions for use with an overcoated photoresist

Applicant:

Rohm and Haas Electronic Materials Korea Ltd., Cheonan, Chungcheongnam-Do, KR;

Inventors:

Jae Hwan Sim, Chungcheongnam-do, KR;

Jung Kyu Jo, Gyeonggi-do, KR;

EunHye Cho, Chungcheongnam-do, KR;

Hye-Won Lee, Gyeonggi-do, KR;

Jin Hong Park, Gyeonggi-Do, KR;

Eui-Hyun Ryu, Chungcheongnam-Do, KR;

Jae-Bong Lim, Chungcheongnam-Do, KR;

Assignee:

Rohm and Haas Electronics Materials Korea Ltd., Cheonan, Chungcheongnam-do, KR;

Attorneys:

Mintz Levin Cohn Ferris Glovksy and Popeo, P.C.

Peter F. Corless

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/09 (2006.01); G03F 7/20 (2006.01); C08L 35/06 (2006.01); G03F 7/30 (2006.01); G03F 7/40 (2006.01); C09D 167/02 (2006.01); C09D 125/18 (2006.01); H01L 21/02 (2006.01); C08F 220/34 (2006.01); H01L 21/027 (2006.01); C08F 220/38 (2006.01); C08F 220/26 (2006.01); H01L 21/311 (2006.01); C08F 220/18 (2006.01); C08F 220/30 (2006.01); C08F 220/32 (2006.01); C08G 63/685 (2006.01); C08G 63/78 (2006.01); C09D 5/00 (2006.01); C09D 133/08 (2006.01); C09D 133/14 (2006.01); C09D 167/00 (2006.01); G03F 7/16 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); C08F 220/18 (2013.01); C08F 220/26 (2013.01); C08F 220/30 (2013.01); C08F 220/32 (2013.01); C08F 220/34 (2013.01); C08F 220/38 (2013.01); C08G 63/685 (2013.01); C08G 63/78 (2013.01); C08L 35/06 (2013.01); C09D 5/006 (2013.01); C09D 125/18 (2013.01); C09D 133/08 (2013.01); C09D 133/14 (2013.01); C09D 167/00 (2013.01); C09D 167/02 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/20 (2013.01); G03F 7/2006 (2013.01); G03F 7/30 (2013.01); G03F 7/327 (2013.01); G03F 7/40 (2013.01); H01L 21/0276 (2013.01); H01L 21/02282 (2013.01); H01L 21/02343 (2013.01); H01L 21/31133 (2013.01); C08F 2220/302 (2013.01); C08F 2220/325 (2013.01); C08L 2666/04 (2013.01);
Abstract

In a preferred aspect, organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more glycidyl groups; and 2) one or more aromatic groups that each comprises two or more substituents that comprise hydroxy, thiol and/or amine moieties. Catechol-containing polymers and methods for producing same also are provided.

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