Jung Kyu Jo

Title: Innovations in Antireflective Coatings: The Contributions of Jung Kyu Jo

Introduction: Jung Kyu Jo is a prominent inventor located in Gyeonggi-do, South Korea. With a commendable portfolio of six patents, he has made significant contributions to the field of materials science, particularly in the development of advanced coating compositions utilized in nanolithography.

Latest Patents: Among his latest innovations is an organic bottom antireflective coating composition designed for nanolithography applications. This innovative coating composition helps to prevent the pull-back phenomenon, where the anti-reflective layer tears on pattern corners during the heat curing process. Notably, it enhances the gap-filling performance of patterns by incorporating a crosslinker attached to a polymer, while minimizing the content of low-molecular-weight crosslinkers to regulate the heat curing initiation temperature.

Additionally, Jung has developed coating compositions tailored for use with overcoated photoresists. These organic coatings consist of a blend of two or more resins, one of which features epoxy groups—either pendant or fused to the polymer backbone. The preferred formulations include a first resin containing epoxy reactive groups and a distinct crosslinker resin that also possesses epoxy groups, showcasing Jung’s innovative approach to improving photolithographic processes.

Career Highlights: Throughout his career, Jung Kyu Jo has worked with leading companies in the electronic materials industry. Notable among these are Rohm and Haas Electronic Materials Korea Ltd. and Rohm & Haas Electronic Materials LLC, where he contributed to the advancement of electronic materials and coating technologies.

Collaborations: In his innovative journey, Jung has collaborated with esteemed colleagues such as Jae Hwan Sim and Jae-Bong Lim. These partnerships have facilitated the exchange of ideas and bolstered the development of sophisticated materials that continue to shape the advancement of nanolithography and other related fields.

Conclusion: Jung Kyu Jo's inventive spirit and dedication to material science have led to significant advancements in antireflective coating technologies. His contributions not only enhance the capabilities of nanolithography processes but also set a benchmark for future innovations in this vital industry. As he continues to push the boundaries of research and development, Jung Kyu Jo remains a key figure in the realm of coatings and materials innovation.