Company Filing History:

20 out of 131,611

Samsung Electronics Co., Ltd.

patents

1 out of 962

Chartered Semiconductor Manufacturing Ltd (corporation)

patents

1 out of 14,724

Infineon Technologies Ag

patents

where one patent can have more than one assignee

Years Active: 2001-2020

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20 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10651179 - Integrated circuit device and method of manufacturing the same (2020-05-12),

2. 10134856 - Semiconductor device including contact plug and method of manufacturing the same (2018-11-20),

3. 10014304 - Integrated circuit device and method of manufacturing the same (2018-07-03),

4. 9613002 - Method of calibrating target values and processing systems configured to calibrate the target values (2017-04-04),

5. 9508727 - Integrated circuit device and method of manufacturing the same (2016-11-29),

6. 8008177 - Method for fabricating semiconductor device using a nickel salicide process (2011-08-30),

7. 7800134 - CMOS integrated circuit devices having stressed NMOS and PMOS channel regions therein (2010-09-21),

8. 7781322 - Nickel alloy salicide transistor structure and method for manufacturing same (2010-08-24),

9. 7781276 - Methods of forming CMOS integrated circuits that utilize insulating layers with high stress characteristics to improve NMOS and PMOS transistor carrier mobilities (2010-08-24),

10. 7534678 - Methods of forming CMOS integrated circuit devices having stressed NMOS and PMOS channel regions therein and circuits formed thereby (2009-05-19),

11. 7465617 - Method of fabricating a semiconductor device having a silicon oxide layer, a method of fabricating a semiconductor device having dual spacers, a method of forming a silicon oxide layer on a substrate, and a method of forming dual spacers on a conductive material layer (2008-12-16),

12. 7365025 - Methods of forming dual-damascene interconnect structures on semiconductor substrates using multiple planarization layers having different porosity characteristics (2008-04-29),

13. 7297584 - Methods of fabricating semiconductor devices having a dual stress liner (2007-11-20),

14. 7098123 - Methods of forming a semiconductor device having a metal gate electrode and associated devices (2006-08-29),

15. 7084061 - Methods of fabricating a semiconductor device having MOS transistor with strained channel (2006-08-01),

Title: Innovations and Contributions of Ja-hum Ku in Semiconductor Technology

Introduction

Ja-hum Ku, an accomplished inventor based in Gyeonggi-do, South Korea, has made significant contributions to the field of semiconductor technology. With a total of 20 patents to his name, Ku has demonstrated a strong commitment to innovation in integrated circuit design and manufacturing processes.

Latest Patents

Among his latest patents, Ja-hum Ku has developed a pioneering integrated circuit device and method of manufacturing the same. This method includes the provision of a plurality of active regions on a substrate, with a first device isolation layer situated between selected active regions. It incorporates a gate layer that forms multiple gate lines and utilizes an insulation layer covering the active regions and isolation layers. Additionally, the inter-gate insulation region optimizes the space between the gate lines, showcasing his expertise in semiconductor design.

Another noteworthy patent, a semiconductor device that includes a contact plug and its manufacturing method, features an active fin protruding from an isolation pattern on a substrate. This device comprises a gate structure on the active fin, configured source/drain layers, and a specialized metal silicide pattern, which further exemplifies his innovative approach to semiconductor devices.

Career Highlights

Throughout his career, Ku has worked with prestigious companies, including Samsung Electronics Co., Ltd. and Chartered Semiconductor Manufacturing Ltd. His roles at these corporations have played a pivotal role in the development of advanced semiconductor technologies and have further established his expertise in the industry.

Collaborations

Ja-hum Ku has collaborated with prominent professionals in the field, notably with colleagues such as Sun-Pil Youn and Min-Chul Sun. Their collective efforts have contributed to the advancement of semiconductor manufacturing techniques and innovations that continue to impact the technology landscape.

Conclusion

Ja-hum Ku remains a prominent figure in semiconductor innovation, with his extensive portfolio of patents reflecting a dedication to improving integrated circuit technology. His contributions, through groundbreaking inventions and collaborations, continue to shape the future of the semiconductor industry.

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