logo

For the Inventor, By the Inventor

Yokohama, Japan

Itsuko Sakai

This inventor holds 18 USPTO granted patents, primarily in Plasma Processing Technology. Top assignees: Kabushiki Kaisha Toshiba, Tokyo Electron Limited, Tokyo Electron Yamanashi Limited. Active years: 1994-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Itsuko Sakai. Retrieved from https://idiyas.com/inventor/itsuko-sakai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 18

% Patents Active = 61.1

Average Co-Inventor Count = 3.7

ph-index = 7

Forward Citations = 217(Granted Patents)


Location History:

  • Kawasaki, JP (1996)
  • Chiryu-shi, Aichi-ken, JP (2000)
  • Kanagawa-ken, JP (2004)
  • Kanagawa, JP (1994 - 2009)
  • Yokohama, JP (1998 - 2013)

Company Filing History:

goldMedal15 out of 53,286 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal6 out of 10,933 
 
Tokyo Electron Limited
 patents
bronzeMedal1 out of 71 
 
Tokyo Electron Yamanashi Limited
 patents
4. 3 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 1994-2013

Loading Chart...
Areas of Expertise:
Semiconductor Device
Plasma Processing
Edge Detection
Gas Recirculation
Silicon Etching
Cleaning Method
Charged Beam Apparatus
High Temperature Superconductive Material
Processing Method
Vacuum System
Plasma Treatment
Capacitive Coupling
18 patents (USPTO):Explore Patents
1. 8580652 - Semiconductor device and manufacturing method thereof (2013-11-12),
2. 8339615 - Edge detection method for transparent substrate by detecting non-light-emitting region of transparent substrate (2012-12-25),
3. 7767055 - Capacitive coupling plasma processing apparatus (2010-08-03),
4. 7628931 - Processing method for conservation of processing gases (2009-12-08),
5. 7368876 - Plasma processing apparatus (2008-05-06),
6. 7186315 - Plasma treatment apparatus (2007-03-06),
7. 7182879 - Plasma processing method (2007-02-27),
8. 7022616 - High speed silicon etching method (2006-04-04),
9. 6938638 - Gas circulating-processing apparatus (2005-09-06),
10. 6782907 - Gas recirculation flow control method and apparatus for use in vacuum system (2004-08-31),
11. 6780278 - Plasma processing apparatus with reduced parasitic capacity and loss in RF power (2004-08-24),
12. 6689699 - Method for manufacturing a semiconductor device using recirculation of a process gas (2004-02-10),
13. 6642149 - Plasma processing method (2003-11-04),
14. 6038461 - Plastically deformable high temperature superconductive material and (2000-03-14),
15. 5717294 - Plasma process apparatus (1998-02-10),

Title: Inventor Itsuko Sakai: Revolutionizing Technology in Yokohama

Introduction: Itsuko Sakai is a pioneering inventor based in Yokohama, Japan, known for her groundbreaking contributions to the field of technology.

Latest Patents: Itsuko Sakai holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions, showcasing her innovative mindset and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Itsuko Sakai has worked with leading tech companies in Japan, spearheading projects that have pushed the boundaries of technological advancements.

Collaborations: Itsuko Sakai has collaborated with renowned research institutions and universities in Japan, fostering a culture of innovation and knowledge-sharing within the tech community.

Conclusion: Itsuko Sakai's dedication to innovation and her relentless pursuit of technological excellence continue to inspire the next generation of inventors and engineers worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…