The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2005
Filed:
Dec. 27, 2001
Hiroshi Kubota, Yokohama, JP;
Rempei Nakata, Kamakura, JP;
Naruhiko Kaji, Kamakura, JP;
Itsuko Sakai, Yokohama, JP;
Takashi Yoda, Machida, JP;
Hiroshi Kubota, Yokohama, JP;
Rempei Nakata, Kamakura, JP;
Naruhiko Kaji, Kamakura, JP;
Itsuko Sakai, Yokohama, JP;
Takashi Yoda, Machida, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A gas-circulating processing apparatus which comprises a processing chamber, a gas feeding piping, a gas supply piping, a first exhaust mechanism discharging a gas from the processing chamber, a second exhaust mechanism discharging a portion of a gas discharged from the first exhaust mechanism, a back pressure adjusting mechanism interposed between the first exhaust mechanism and the second exhaust mechanism to adjust a back pressure of the first exhaust mechanism, and a gas circulating piping which is configured to combine another portion of the gas that has been discharged from the first exhaust mechanism with a processing gas supplied from the gas supply piping, wherein the gas feeding piping has a larger inner diameter than that of the gas supply, or the processing gas is introduced into the first exhaust mechanism, or a first heater is provided to heat at least part of the circulating route.