Naruhiko Kaji

Title: Naruhiko Kaji: Innovator in Semiconductor Technology

Introduction

Naruhiko Kaji is a prominent inventor based in Kamakura, Japan, known for his significant contributions to semiconductor technology. With a total of 12 patents to his name, Kaji has made remarkable advancements in the manufacturing methods of semiconductor devices.

Latest Patents

One of Kaji's latest patents involves a manufacturing method of a semiconductor device that focuses on filling insulating film into a trench. This method begins with the formation of a first silicon oxide film on the internal surface of a trench created on a semiconductor substrate using an HDP technique. The deposition of this film is halted before the trench opening closes, allowing for further etching and the formation of a second silicon oxide film on the first. This innovative approach enables the lamination of both films at the trench's bottom.

Another notable patent by Kaji details a method for fabricating a multilayer interconnect wiring structure that incorporates a low-dielectric constant insulator film with enhanced adhesivity. This method is designed for high-density semiconductor integrated circuit devices. It involves preparing a substrate with an inorganic underlayer dielectric film and applying plasma processing to create a hydrophobic surface layer. This layer enhances the adhesion between stacked inorganic and organic films while minimizing electrical resistivity and capacitance.

Career Highlights

Throughout his career, Naruhiko Kaji has worked with esteemed companies such as Toshiba Corporation and Ebara Corporation. His experience in these organizations has allowed him to refine his expertise in semiconductor technology and contribute to various innovative projects.

Collaborations

Kaji has collaborated with notable colleagues, including Rempei Nakata and Yukio Nishiyama. These partnerships have further enriched his work and led to advancements in the field of semiconductor manufacturing.

Conclusion

Naruhiko Kaji's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor devices.