The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2008
Filed:
May. 27, 2004
Toshihiro Hayami, Nirasaki, JP;
Etsuji Ito, Nirasaki, JP;
Itsuko Sakai, Yokohama, JP;
Tokyo Electron Limited, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A low-cost plasma processing apparatus which permits reduction of the cost, as well as reduction of the loss of transmitted power. The plasma processing apparatushas an apparatus main bodyand auxiliary equipment. The auxiliary equipmentis comprised of a power supply apparatusthat supplies power to a processing chamber, and a plurality of dry pumpsand, and so on. The power supply apparatusis comprised of a matching unit, an RF amplifierthat is connected to the matching unitvia a coaxial cable, and a power controllerhaving a DC amplifiertherein. The RF amplifieris formed in a separate body to the DC amplifierand disposed in a position away from the DC amplifierand close to the matching unit, and is connected to the DC amplifiervia an ordinary cable