IDiyas

For the Inventor, By the Inventor

Port Chester, NY, United States of America

Igor Matheus Petronella Aarts

USPTO Granted Patents = 17 

Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Eindhoven, NL (2012 - 2013)
  • Port Chester, NY (US) (2019 - 2024)

Company Filing History:

goldMedal11 out of 618 
 
Asml Holding N.v.
 patents
silverMedal8 out of 4,883 
 
Asml Netherlands B.v.
 patents
bronzeMedal1 out of 23 
 
Asml Holdings N.v.
 patents
where one patent can have more than one assignee

Years Active: 2012-2025

Loading Chart...
17 patents (USPTO):
1. 12474647 - Generating an alignment signal based on local alignment mark distortions (2025-11-18),
2. 12461457 - Asymmetry extended grid model for wafer alignment (2025-11-04),
3. 12032299 - Metrology method and associated metrology and lithographic apparatuses (2024-07-09),
4. 11971665 - Wafer alignment using form birefringence of targets or product (2024-04-30),
5. 11899380 - Apparatus for and method of sensing alignment marks (2024-02-13),
6. 11835752 - Broad spectrum radiation by supercontinuum generation using a tapered optical fiber (2023-12-05),
7. 11513446 - Adaptive alignment (2022-11-29),
8. 11493852 - Noise correction for alignment signal (2022-11-08),
9. 11175593 - Alignment sensor apparatus for process sensitivity compensation (2021-11-16),
10. 11156928 - Alignment mark for two-dimensional alignment in an alignment system (2021-10-26),
11. 10928738 - Adaptive filter for in-line correction (2021-02-23),
12. 10802208 - Broad spectrum radiation by supercontinuum generation using a tapered optical fiber (2020-10-13),
13. 10488767 - Alignment system wafer stack beam analyzer (2019-11-26),
14. 10481507 - Measurement method comprising in-situ printing of apparatus mark and corresponding apparatus (2019-11-19),
15. 8477289 - Position measurement using natural frequency vibration of a pattern (2013-07-02),

Title: The Innovative Mind of Igor Matheus Petronella Aarts

Introduction

Igor Matheus Petronella Aarts, a prolific inventor based in Port Chester, NY, has made significant contributions to the field of metrology and lithography. With 14 patents to his name, Aarts' innovative work has revolutionized the way structures on substrates are measured and aligned.

Latest Patents

Aarts' latest patents showcase his expertise in metrology methods and wafer alignment using form birefringence of targets or products. His metrology method involves measuring asymmetric deviations of structures on substrates by analyzing intensity asymmetry values and phase offset values. Meanwhile, his wafer alignment method utilizes diffraction gratings with varying duty cycles to accurately determine the location of alignment targets.

Career Highlights

Aarts has worked with leading companies in the industry, including ASML Holding N.V. and ASML Netherlands B.V. His expertise in metrology and lithography has been instrumental in developing cutting-edge technologies for the semiconductor industry. Aarts' commitment to innovation and precision has earned him a reputation as a visionary in his field.

Collaborations

Throughout his career, Aarts has collaborated with esteemed colleagues such as Krishanu Shome and Engelbertus Antonius Fransiscus Van Der Pasch. Together, they have worked on groundbreaking projects that have pushed the boundaries of metrology and lithography, leading to important advancements in the semiconductor industry.

Conclusion

Igor Matheus Petronella Aarts' dedication to innovation and precision has cemented his legacy as a pioneering inventor in the field of metrology and lithography. His groundbreaking patents and collaborative efforts have helped shape the future of semiconductor technology, making him a key figure in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…