The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Mar. 21, 2022
Asml Netherlands B.v., Veldhoven, NL;
Joshua Adams, Wilton, CT (US);
Leonardo Gabriel Montilla, Norwalk, CT (US);
Nick Franciscus Wilhelmus Thissen, Eindhoven, NL;
Leendert Jan Karssemeijer, 's Hertogenbosch, NL;
Igor Matheus Petronella Aarts, Port Chester, NY (US);
Zahrasadat Dastouri, Norwalk, CT (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
Systems, apparatuses, and methods are provided for correcting the detected positions of alignment marks disposed on a substrate and aligning the substrate using the corrected data to ensure accurate exposure of one or more patterns on the substrate. An example method can include receiving measurement data indicative of an interference between light diffracted from a plurality of alignment marks disposed on a substrate or reflected from the substrate. The example method can further include determining substrate deformation data based on the measurement data. The example method can further include determining alignment mark deformation data based on the measurement data. The alignment mark deformation data can include alignment mark deformation spectral pattern data, alignment mark deformation amplitude data, and alignment mark deformation offset data. Subsequently, the example method can include determining a correction to the measurement data based on the substrate deformation data and the alignment mark deformation data.