The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
May. 17, 2017
Applicant:
Asml Holding N.v., Veldhoven, NL;
Inventors:
Krishanu Shome, Cheshire, CT (US);
Igor Matheus Petronella Aarts, Port Chester, NY (US);
Justin Lloyd Kreuzer, Trumbull, CT (US);
Irit Tzemah, Norwalk, CT (US);
Assignee:
ASML Holding N.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7049 (2013.01); G03F 9/7073 (2013.01);
Abstract
An alignment system obtains the characteristics of the light coming back from a wafer stack. A beam analyzer measures changes in wavelength, polarization, and beam profile. This measured information allows for in-line process variation corrections. The correction provides optical monitoring of individual mark stack variations, and in turn provides information to reduce individual mark process variation-induced accuracy error.