The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2021

Filed:

Apr. 03, 2019
Applicants:

Asml Netherlands B.v., Veldhoven, NL;

Asml Holding N.v., Veldhoven, NL;

Inventors:

Simon Reinald Huisman, Eindhoven, NL;

Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, New Canaan, CT (US);

Yuxiang Lin, Wilton, CT (US);

Vu Quang Tran, Norwalk, CT (US);

Sebastianus Adrianus Goorden, Eindhoven, NL;

Justin Lloyd Kreuzer, Trumbull, CT (US);

Christopher John Mason, Newtown, CT (US);

Igor Matheus Petronella Aarts, Port Chester, NY (US);

Krishanu Shome, Cheshire, CT (US);

Irit Tzemah, Norwalk, CT (US);

Assignees:

ASML Netherlands B.V., Veldhoven, NL;

ASML Holding N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G03F 7/70191 (2013.01); G03F 7/70625 (2013.01); G03F 7/70641 (2013.01); G03F 9/7088 (2013.01);
Abstract

An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.


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