Wilton, CT, United States of America

Yuxiang Lin

USPTO Granted Patents = 5 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2021-2024

Loading Chart...
5 patents (USPTO):

Title: Innovator Spotlight: Yuxiang Lin - Pioneering Advancements in Metrology Systems

Introduction: Yuxiang Lin, a prolific inventor based in Wilton, CT (US), has made significant contributions to the field of metrology systems with a total of six patents to his name. His innovative work spans across lithographic apparatus, metrology systems, phased array illumination sources, and more.

Latest Patents:

Yuxiang Lin's latest patents showcase his expertise in developing cutting-edge technologies for metrology systems. One patent involves a system comprising radiation sources, phased arrays, and detectors to efficiently measure scattered radiation from target structures. Another patent focuses on wafer alignment using form birefringence of targets, demonstrating his proficiency in precision alignment techniques.

Career Highlights:

Having worked at renowned companies such as ASML Holding N.V. and ASML Netherlands B.V., Yuxiang Lin has honed his skills and knowledge in the metrology industry. His strategic insights and technical acumen have been instrumental in pushing the boundaries of innovation and driving progress in the field.

Collaborations:

Throughout his career, Yuxiang Lin has collaborated with talented individuals such as Justin Lloyd Kreuzer and Tamer Mohamed Tawfik Ahmed Mohamed Elazhary. These partnerships have fostered a culture of creativity and excellence, leading to groundbreaking advancements in metrology systems and related technologies.

Conclusion:

In conclusion, Yuxiang Lin stands as a trailblazer in the realm of metrology systems, with a track record of pioneering inventions and patents that have transformed the industry. His dedication to pushing the boundaries of technological innovation underscores his commitment to advancing the field and creating a lasting impact on future generations of inventors and researchers.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…