The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2023
Filed:
Sep. 14, 2020
Asml Holding N.v., Veldhoven, NL;
Yuxiang Lin, Wilton, CT (US);
Joshua Adams, Wilton, CT (US);
Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, New Canaan, CT (US);
Krishanu Shome, Cheshire, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
A system () includes an illumination system (), a lens element (), and a detector (). The illumination system generates a beam of radiation () having a first spatial intensity distribution () at a pupil plane () and a second spatial intensity distribution () at a plane of a target (). The first spatial intensity distribution comprises an annular intensity profile () or an intensity profile corresponding to three or more beams. The lens element focuses the beam onto the target. The second spatial intensity distribution is a conjugate of the first intensity distribution and has an intensity profile corresponding to a central beam () and one or more side lobes () that are substantially isolated from the central beam. The central beam has a beam diameter of approximately 20 microns or less at the target. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation.