Inventors with similar research interests:
Location History:
- Kadomi, JP (2013)
- Kadoma, JP (1990 - 2014)
- Osaka, JP (1994 - 2018)
Company Filing History:
27 out of 27,375 
26 out of 16,453 
3 out of 13,289 Years Active: 1990-2018
Areas of Expertise:
Title: The Innovative Journey of Ichiro Nakayama: A Pioneer in Plasma Processing Technology
Introduction: Ichiro Nakayama, a prominent inventor based in Osaka, Japan, has cemented his legacy in the field of plasma processing with an impressive portfolio of 58 patents. His groundbreaking contributions have revolutionized the efficiency and effectiveness of plasma processing methods.
Latest Patents:
1. Plasma processing apparatus and plasma processing method: Nakayama's latest invention offers a cutting-edge plasma processing apparatus capable of generating stable and efficient plasma. This apparatus ensures quick and effective treatment of all desired regions on a base material, featuring key components such as an opening portion, a dielectric member, a gas supply pipe, a coil, a high-frequency power supply, and a base material mounting table.
2. Silicon substrate having textured surface, and process for producing same: Addressing the need for novel silicon substrates with textured surfaces, Nakayama's innovation involves dry-etching the surface of a silicon substrate with (111) orientation to create a unique texture. The resulting substrate boasts multiple protrusions with specific heights, enhancing its functionality in various applications.
Career Highlights: Ichiro Nakayama has made significant contributions during his tenure at Matsushita Electric Industrial Co., Ltd., and Panasonic Corporation, where his expertise in plasma processing technologies has led to the development of cutting-edge solutions. His relentless pursuit of innovation has propelled him to the forefront of the industry, earning him recognition as a trailblazer in the field.
Collaborations: Throughout his career, Nakayama has collaborated closely with esteemed colleagues such as Tomohiro Okumura and Bunji Mizuno. Together, they have shared insights, expertise, and passion for pushing the boundaries of plasma processing technology, fostering a culture of innovation and excellence.
Conclusion: Ichiro Nakayama's remarkable journey as an inventor underscores his unwavering commitment to advancing plasma processing technologies. With a diverse portfolio of patents and a legacy of collaboration and innovation, Nakayama continues to shape the landscape of the industry, paving the way for future advancements in the field.