Location History:
- Ching-shuei, TW (2008)
- Ching-Suei, TW (2013 - 2014)
- Taichung county, TW (2008 - 2016)
- Taichung, TW (2013 - 2022)
Company Filing History:
34 out of 40,780 
1 out of 5 Years Active: 2008-2022
Title: Innovations by Hung-Chun Wang: Pioneering Optical Proximity Correction Technologies
Introduction
Hung-Chun Wang, based in Taichung, Taiwan, is a prolific inventor with a remarkable portfolio of 34 patents. His work has significantly advanced the field of integrated circuit (IC) fabrication, particularly in the realm of optical proximity correction (OPC) methodologies.
Latest Patents
Wang's latest patents include groundbreaking innovations such as the "Method of post optical proximity correction (OPC) printing verification by machine learning." This invention involves a method of fabricating an integrated circuit, which includes receiving an IC design layout and performing an OPC process to produce a corrected layout. Machine learning algorithms are utilized to verify the corrected layout by identifying features and comparing them to a comprehensive database.
Another notable patent is the "Optical proximity correction methodology using pattern classification for target placement," which enhances lithography printability through advanced computational techniques. This method optimizes mask fabrication by generating target points based on a classification of the IC pattern, thereby improving the accuracy of the OPC process and contributing to more effective integrated circuit development.
Career Highlights
Wang’s career includes significant contributions while working at renowned companies such as Taiwan Semiconductor Manufacturing Company Limited and Haynes and Boone, LLP. His extensive experience at these institutions has allowed him to refine his innovation skills and deliver impactful inventions in the semiconductor industry.
Collaborations
Throughout his career, Hung-Chun Wang has collaborated with distinguished colleagues such as Wen-Chun Huang and Ru-Gun Liu. These collaborations have fostered an environment of shared knowledge and expertise, further enhancing the quality and applicability of their collective research.
Conclusion
Hung-Chun Wang stands as a pivotal figure in the realm of integrated circuit innovation. With his 34 patents focused on advancing optical proximity correction technology, he continues to shape the future of semiconductor manufacturing. His work exemplifies the intersection of creativity and technical expertise, making him a valuable contributor to the field of inventions.