Huiling Shang

Title: Huiling Shang: Innovator in Semiconductor Technology

Introduction

Huiling Shang is a prominent inventor based in Hsinchu County, Taiwan. She has made significant contributions to the field of semiconductor technology, holding a total of 17 patents. Her innovative work has advanced the development of multi-gate semiconductor devices, which are crucial for modern electronic applications.

Latest Patents

One of her latest patents is titled "Multi-gate device including semiconductor fin between dielectric fins and method of fabrication thereof." This patent describes a method that involves forming a semiconductor fin protruding from a substrate, creating a cladding layer on the sidewalls of the semiconductor fin, and sandwiching the semiconductor fin between first and second dielectric fins. The process includes removing the cladding layer to form trenches and subsequently forming a dummy gate structure over the semiconductor fin. The method also details the formation of an epitaxial feature on the recessed semiconductor fin and the creation of a metal gate stack. Another notable patent is "Isolation structures in multi-gate semiconductor devices and methods of fabricating the same." This patent outlines a semiconductor structure that includes a substrate, an oxide layer, a stack of semiconductor layers, and an epitaxial source/drain feature, which is horizontally surrounded by the oxide layer.

Career Highlights

Huiling Shang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. Her work has been instrumental in pushing the boundaries of semiconductor technology, making her a key figure in her field.

Collaborations

She has collaborated with notable colleagues, including Xusheng Wu and Chang-Miao Liu, contributing to various innovative projects within the company.

Conclusion

Huiling Shang's contributions to semiconductor technology through her patents and collaborations highlight her role as a leading inventor in the industry. Her work continues to influence advancements in electronic devices and systems.