Shanghai, China

Hui Wang

USPTO Granted Patents = 105 

 

Average Co-Inventor Count = 3.7

ph-index = 7

Forward Citations = 331(Granted Patents)

Forward Citations (Not Self Cited) = 323(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:

goldMedal53 out of 65 
 
Acm Research (shanghai) Inc.
 patents
silverMedal7 out of 27,246 
 
Huawei Technologies Co., Limited
 patents
bronzeMedal6 out of 829 
 
Fluke Corporation
 patents
44 out of 18 
 
Shanghai Xiaoi Robot Technology Co., Ltd.
 patents
54 out of 8 
 
Shanghai Microport Ep Medtech Co., Ltd.
 patents
63 out of 1,264 
 
Integrated Device Technology, Inc.
 patents
73 out of 15,608 
 
Honeywell International Inc.
 patents
83 out of 1,724 
 
Semiconductor Manufacturing International (shanghai) Corporation
 patents
93 out of 37,972 
 
Micron Technology Incorporated
 patents
102 out of 3,100 
 
Chinese Academy of Sciences
 patents
112 out of 17 
 
Acm Research, Inc.
 patents
122 out of 2 
 
Innomotion Incorporation (shanghai)
 patents
132 out of 144 
 
Shenzhen Yinwang Intelligent Technologies Co., Ltd.
 patents
142 out of 68 
 
Shanghaitech University
 patents
151 out of 164,197 
 
International Business Machines Corporation
 patents
161 out of 5,919 
 
Sap Se
 patents
171 out of 526 
 
Tyco Electronics (shanghai) Co., Ltd.
 patents
181 out of 5,032 
 
Alcatel Lucent
 patents
191 out of 2,351 
 
Lear Corporation
 patents
201 out of 934 
 
Semiconductor Manufacturing International (beijing) Corporation
 patents
211 out of 3 
 
Forcome (shanghai) Co., Ltd
 patents
221 out of 1 
 
Ominivision Optoelectronics Technologies (shanghai) Co., Ltd.
 patent
231 out of 123 
 
Shanghai Huahong Grace Semiconductor Manufacturing Corporation
 patents
241 out of 207 
 
Baoshan Iron & Steel Co., Ltd.
 patents
251 out of 54,719 
 
Microsoft Technology Licensing, LLC
 patents
where one patent can have more than one assignee

Years Active: 2011-2025

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Areas of Expertise:
Substrate Processing
Voltage Throttling
Plating Apparatus
Strain Gauge Sensors
Medical Catheters
Wireless Charging
Electroplating Techniques
Lithography Processes
Semiconductor Cleaning
Pressure Measurement Devices
Gas Pump Technology
Hydrocarbon Catalysis
105 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Hui Wang

Introduction

Hui Wang, located in Shanghai, China, is an influential inventor with a commendable portfolio of 92 patents. His innovative contributions span various fields, significantly impacting technology and industry practices.

Latest Patents

Among his most recent patents is the "Channel information feedback method and communication apparatus." This invention involves a sophisticated method for providing channel state information feedback using a terminal device. The device selects complex coefficients based on a preset priority rule to enhance communication efficiency.

Another remarkable patent is the "Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device." This method innovatively cleans substrates by combining rotation, high-temperature chemical solutions, and ultrasonic devices, demonstrating a nuanced approach to achieving high cleanliness standards in various applications.

Career Highlights

Hui Wang has acquired considerable experience working with prestigious companies, including ACM Research (Shanghai) Inc. and Huawei Technologies Co., Limited. His tenure at these firms reflects his dedication to technical excellence and innovation.

Collaborations

Throughout his career, Hui has collaborated with notable professionals in the field, such as Jian Wang and Fuping Chen. These partnerships have likely enriched his work and fostered advancements in technology and ability to innovate.

Conclusion

Hui Wang stands out as a prominent figure in the landscape of invention, with a robust patent portfolio and impactful innovations. His work not only showcases his inventiveness but also contributes to advancements in various technological domains. His ongoing efforts continue to shape the future of communication and substrate cleaning techniques.

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