Aalen, Germany

Holger Kierey

USPTO Granted Patents = 12 

 

Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2007-2024

where 'Filed Patents' based on already Granted Patents

12 patents (USPTO):

Title: Holger Kierey: Innovator in Optical Technologies

Introduction

Holger Kierey is a prominent inventor based in Aalen, Germany, known for his significant contributions to optical technologies. With a total of 12 patents to his name, Kierey has made remarkable advancements in the field of projection exposure apparatuses and EUV lithography.

Latest Patents

Kierey's latest patents include a mirror for an illumination optical unit of a projection exposure apparatus, which features a spectral filter in the form of a grating structure. This innovative design allows for a maximum edge steepness in the range of 15° to 60°. Another notable patent is an arrangement for an EUV lithography apparatus, which includes a reflective optical element designed to reflect incident EUV radiation. This arrangement also incorporates a filament that produces a reagent to clean the optically effective surface, ensuring optimal performance.

Career Highlights

Throughout his career, Holger Kierey has worked with esteemed companies such as Carl Zeiss SMT GmbH and Carl Zeiss Laser Optics GmbH. His work in these organizations has significantly influenced the development of advanced optical systems.

Collaborations

Kierey has collaborated with notable professionals in the field, including Wolfgang Merkel and Vitaliy Shklover. These partnerships have fostered innovation and contributed to the success of various projects.

Conclusion

Holger Kierey's contributions to optical technologies and his impressive portfolio of patents underscore his role as a leading inventor in the industry. His work continues to impact the field of lithography and optical systems significantly.

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