The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
Nov. 26, 2018
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Ingrid Schuster, Oberkochen, DE;
Wolfgang Merkel, Neu-Ulm, DE;
Georgo Metalidis, Koenigsbronn-Zang, DE;
Holger Kierey, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An EUV collector for use in an EUV projection exposure apparatus includes at least one mirror surface having surface structures for scattering a used EUV wavelength (λ) of used EUV light. The mirror surface has a surface height with a spatial wavelength distribution between a lower limit spatial wavelength and an upper limit spatial wavelength. An effective roughness (rmsG) below the lower limit spatial wavelength (PG) satisfies the following relation: (4π rmsG cos(θ)/λ)<0.1. θ denotes an angle of incidence of the used EUV light at the mirror surface. The following applies to an effective roughness (rmsGG') between the lower limit spatial wavelength (PG) and the upper limit spatial wavelength (PG′): 1.5 rmsG<rmsGG′<6 rmsG.