The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2020
Filed:
Jan. 25, 2019
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Dirk Heinrich Ehm, Beckingen, DE;
Vitaliy Shklover, Koenigsbronn, DE;
Irene Ament, Aalen, DE;
Stefan-Wolfgang Schmidt, Aalen, DE;
Moritz Becker, Aalen, DE;
Stefan Wiesner, Lauchheim, DE;
Diana Urich, Munich, DE;
Robert Meier, Munich, DE;
Ralf Winter, Schwaebisch Gmuend, DE;
Christof Jalics, Heidenheim, DE;
Holger Kierey, Aalen, DE;
Eric Eva, Aalen, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
In order to prevent delamination of a reflective coating from the substrate under the influence of reactive hydrogen, a reflective optical element () for EUV lithography is provided, which has a substrate () and a reflective coating () for reflecting radiation in the wavelength range of 5 nm to 20 nm. A functional layer () is arranged between the reflective coating () and the substrate (). With the functional layer, the concentration of hydrogen in atom % at the side of the substrate facing the reflective coating is reduced by at least a factor of 2.