Company Filing History:
Years Active: 2020
Title: Diana Urich: Innovator in Semiconductor Lithography
Introduction
Diana Urich, an accomplished inventor based in Munich, Germany, has made significant contributions to the field of semiconductor lithography. With a total of two patents to her name, Urich has been at the forefront of technological innovations that enhance the efficiency and effectiveness of projection exposure systems.
Latest Patents
Urich's latest patents showcase her expertise in semiconductor technology. The first patent is a "Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning." This innovative projection exposure apparatus features a partial volume closed off from its surroundings where plasma can be produced. The inclusion of conditioning elements in this setup aims to neutralize the plasma effectively, enhancing operational capabilities.
The second patent is for a "Reflective optical element for EUV lithography." This invention addresses the issue of delamination of reflective coatings caused by reactive hydrogen. The reflective optical element is designed to maintain performance in the wavelength range of 5 nm to 20 nm. By introducing a functional layer between the reflective coating and the substrate, this innovation significantly reduces hydrogen concentration, thus improving the durability of the coating.
Career Highlights
Diana Urich is associated with Carl Zeiss SMT GmbH, a company renowned for its state-of-the-art optical systems and solutions in the semiconductor sector. Her work reflects the company's commitment to advancing technology in lithography, making significant impacts in the semiconductor manufacturing processes.
Collaborations
Throughout her career, Urich has collaborated with talented coworkers including Irene Ament and Dirk Heinrich Ehm. These partnerships have undoubtedly played a role in her innovative endeavors, fostering an environment of creativity and technological advancement.
Conclusion
Diana Urich stands out as a remarkable female inventor in the field of semiconductor lithography. Her patents not only illustrate her technical prowess but also highlight her contribution to enhancing the capabilities of lithographic systems. As the industry continues to evolve, Urich's work exemplifies the ongoing innovation that drives the future of technology.