The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2020
Filed:
Nov. 21, 2018
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Irene Ament, Aalen, DE;
Dirk Heinrich Ehm, Beckingen, DE;
Stefan Wolfgang Schmidt, Aalen, DE;
Moritz Becker, Aalen, DE;
Stefan Wiesner, Lauchheim, DE;
Diana Urich, Munich, DE;
Assignee:
CARL ZEISS SMT GMBH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); B08B 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70925 (2013.01); B08B 7/0035 (2013.01); G03F 7/70033 (2013.01); G03F 7/70883 (2013.01); G03F 7/70916 (2013.01); G03F 7/70933 (2013.01);
Abstract
A projection exposure apparatus () for semiconductor lithography contains at least one partial volume () that is closed off from the surroundings. The partial volume () contains a gas, from which a plasma can be produced. Conditioning elements () for conditioning the plasma, in particular for neutralizing the plasma, are present in the partial volume. An associated method for operating a projection exposure apparatus is also disclosed.