The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
May. 05, 2006
Vitaliy Shklover, Konigsbronn, DE;
Holger Kierey, Aalen, DE;
Holger Muenz, Aalen, DE;
Michel Le Maire, Oberkochen, DE;
Bernhard Weigl, Steinheim, DE;
Vitaliy Shklover, Konigsbronn, DE;
Holger Kierey, Aalen, DE;
Holger Muenz, Aalen, DE;
Michel Le Maire, Oberkochen, DE;
Bernhard Weigl, Steinheim, DE;
Carl Zeiss Laser Optics GmbH, Oberkochen, DE;
Abstract
The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.