Carl Zeiss Smt Gmbh

Carl Zeiss Laser Optics Gmbh

Holger Kierey

Wolfgang Merkel

Vitaliy Shklover

Arno Schmittner

Christof Jalics

Eric Eva

Willi Anderl

Michel Le Maire

Ralf Winter

Bernhard Weigl

Georgo Metalidis

Robert Meier

Hubert Holderer

Dirk Heinrich Ehm

Holger Muenz

Johannes Zellner

Stefan-Wolfgang Schmidt

Markus Bauer

Moritz Becker

Stefan Wiesner

Heiko Siekmann

Alexey Sergeevich Kuznetsov

Irene Ament

Christoph Nottbohm

Ingrid Schuster

Andre Bresan

Klaus Heidemann

Florian Herold

Diana Urich

Ralf Moser

Bruno Nelles

Tobias Meisch

Andreas Sandner

Fabian Schuster

Anton Lengel

Andreas Kolloch

Marcus Schmelzeisen

Ann-Kathrin Wandner

A mirror for an illumination optical unit of a projection exposure apparatus comprises a spectral filter in the form of a grating structure, wherein the grating structure has a maximum edge steepness in the range of 15° to 60°.

Mirror for an illumination optical unit of a projection exposure apparatus comprising a spectral filter in the form of a grating structure and method for producing a spectral filter in the form of a grating structure on a mirror

An arrangement for an EUV lithography apparatus includes a reflective optical element () having an optically effective surface () configured to reflect incident EUV radiation, and a filament arrangement () configured to produce a reagent that cleans the optically effective surface (). The filament arrangement () has at least one filament () configured as a glow or heating element. The at least one filament () is arranged along the optically effective surface () of the reflective optical element () wherein a thickness and/or positioning of the at least one filament () are/is chosen so as to minimize an optical influence of the at least one filament () in the far field of the EUV radiation reflected by the optically effective surface ().

Arrangement for an EUV lithography apparatus

A cost-effective method for repairing reflective optical elements for EUV lithography. These optical elements () have a substrate () and a coating () that reflects at a working wavelength in the range between 5 nm and 20 nm and is damaged as a result of formation of hydrogen bubbles. The method includes: localizing a damaged area () in the coating () and covering the damaged area () with one or more materials having low hydrogen permeability by applying a cover element to the damaged area. The cover element is formed of a surface structure, a convex or concave surface, or a coating corresponding to the coating of the reflective optical element, or a combination thereof. The method is particularly suitable for collector mirrors () for EUV lithography. After the repair, the optical elements have cover elements ().

Method for repairing reflective optical elements for EUV lithography

In order to prevent delamination of a reflective coating from the substrate under the influence of reactive hydrogen, a reflective optical element () for EUV lithography is provided, which has a substrate () and a reflective coating () for reflecting radiation in the wavelength range of 5 nm to 20 nm. A functional layer () is arranged between the reflective coating () and the substrate (). With the functional layer, the concentration of hydrogen in atom % at the side of the substrate facing the reflective coating is reduced by at least a factor of 2.

Reflective optical element for EUV lithography

An EUV collector serves for use in an EUV projection exposure apparatus. The collector guides EUV used light emitted by a plasma source region. An overall impingement surface of the collector is impinged upon by radiation emitted by the plasma source region. A used light portion of the overall impingement surface guides the EUV used light. An extraneous light portion of the overall impingement surface is impinged upon by extraneous light radiation, the wavelength of which differs from that of the used light. The used light portion and the extraneous light portion are not congruent. This EUV collector has increased efficiency can involve reduced production costs.

EUV collector for use in an EUV projection exposure apparatus

The disclosure relates to an optical element, in particular for a microlithographic projection exposure apparatus. The optical element has an optical effective surface. The optical element includes a substrate, a layer system that is present on the substrate, and a protective cover extending over an edge region of the optical element that is adjacent to the optical effective surface. During operation of the optical element, the protective coating reduces an ingress of hydrogen radicals into the layer system in comparison with an analogous design without the protective cover, wherein a gap is formed between the protective cover and the layer system.

Optical element, in particular for a microlithographic projection exposure apparatus

An EUV collector for use in an EUV projection exposure apparatus includes at least one mirror surface having surface structures for scattering a used EUV wavelength (&#x3bb;) of used EUV light. The mirror surface has a surface height with a spatial wavelength distribution between a lower limit spatial wavelength and an upper limit spatial wavelength. An effective roughness (rmsG) below the lower limit spatial wavelength (PG) satisfies the following relation: (4&#x3c0; rmsG cos(&#x3b8;)/&#x3bb;)&#x3c;0.1. &#x3b8; denotes an angle of incidence of the used EUV light at the mirror surface. The following applies to an effective roughness (rmsGG') between the lower limit spatial wavelength (PG) and the upper limit spatial wavelength (PG&#x2032;): 1.5 rmsG&#x3c;rmsGG&#x2032;&#x3c;6 rmsG.

EUV Collector

The disclosure relates to a cooler for use in a device in a vacuum, wherein the partial pressure of the cooling medium in the vacuum environment during the operation of the cooler is less than 10mbar. The cooler includes a heat sink, wherein a cavity through which the cooling medium flows is formed in the heat sink, and wherein the heat sink includes a connection element which surrounds one end of the cavity through which the cooling medium flows. The cooler also includes a connecting piece for joining a coolant line to the cavity. The connecting piece includes a jacket secured on the connection element by a thermal connecting process. An intermediate layer is between the jacket and the connection element. The jacket exerts a force in the direction of the connection element so that the intermediate layer is under compressive stress in the radial direction during operation of the cooler.

Cooler for use in a device in a vacuum

A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.

Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type

A reflective optical element for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.

Reflective optical element for use in an EUV system

The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.

Optical devices and related systems and methods

In a method for manufacturing a blazed grating from a prefabricated initial blazed grating, a blazed grating the substrate of a first material of which has a surface, which has an initial surface profile having an initial blaze angle, is provided. An auxiliary layer of a second material is applied onto the surface of the substrate, wherein the second material is different from the first material. The auxiliary layer is removed at least partially by means of etching, wherein the etching is carried out at least until the etching simultaneously acts on the auxiliary layer and on the initial surface profile of the substrate. A ratio between an etching rate for the auxiliary layer and an etching rate for the substrate is adjusted such that the initial blaze angle is reduced to a final blaze angle. Further, a blazed grating manufactured in that way and an optical device having such a blazed grating, are described.

Method for manufacturing a blazed grating, such a blazed grating and a spectrometer having such a blazed grating

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Aalen, Germany

Holger Kierey