The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 2013

Filed:

Aug. 05, 2010
Applicants:

Holger Kierey, Aalen, DE;

Michel Le Maire, Oberkochen, DE;

Willi Anderl, Huettlingen, DE;

Hubert Holderer, Oberkochen, DE;

Anton Lengel, Oberkochen, DE;

Inventors:

Holger Kierey, Aalen, DE;

Michel Le Maire, Oberkochen, DE;

Willi Anderl, Huettlingen, DE;

Hubert Holderer, Oberkochen, DE;

Anton Lengel, Oberkochen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A reflective optical element for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.


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