The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2022
Filed:
May. 24, 2020
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Holger Kierey, Aalen, DE;
Wolfgang Merkel, Neu-Ulm, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
An arrangement for an EUV lithography apparatus includes a reflective optical element () having an optically effective surface () configured to reflect incident EUV radiation, and a filament arrangement () configured to produce a reagent that cleans the optically effective surface (). The filament arrangement () has at least one filament () configured as a glow or heating element. The at least one filament () is arranged along the optically effective surface () of the reflective optical element () wherein a thickness and/or positioning of the at least one filament () are/is chosen so as to minimize an optical influence of the at least one filament () in the far field of the EUV radiation reflected by the optically effective surface ().