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For the Inventor, By the Inventor

Nirasaki, Japan

Hitoshi Itoh

This inventor holds 18 USPTO granted patents, primarily in Plasma Processing Technology. Top assignees: Tokyo Electron Limited, Nagoya University, Tohoku University. Active years: 2007-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hitoshi Itoh. Retrieved from https://idiyas.com/inventor/hitoshi-itoh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 18

% Patents Active = 16.7

Average Co-Inventor Count = 3.1

ph-index = 5

Forward Citations = 63(Granted Patents)


Location History:

  • Nirasaki, JP (2011 - 2014)
  • Yamanashi, JP (2012 - 2016)
  • Tsukuba, JP (2016)
  • Tokyo, JP (2007 - 2017)

Company Filing History:

goldMedal17 out of 10,933 
 
Tokyo Electron Limited
 patents
silverMedal3 out of 371 
 
Nagoya University
 patents
bronzeMedal3 out of 1,054 
 
Tohoku University
 patents
4. 1 out of 1,011 
 
Central Glass Company, Limited
 patents
5. 1 out of 2 
 
Seishin Enterprise Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 2007-2017

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Areas of Expertise:
Plasma Processing
Film Forming
Semiconductor Manufacturing
Microwave Apparatus
Dry Cleaning Method
Metal Oxide Film
Processing System
Particle Feed Apparatus
Pretreatment Device
Storage Medium
Substrate Processing
18 patents (USPTO):Explore Patents
1. 9852892 - Microwave supply apparatus, plasma processing apparatus, and plasma processing method (2017-12-26),
2. 9266146 - Film forming method and processing system (2016-02-23),
3. 9252000 - Microwave waveguide apparatus, plasma processing apparatus and plasma processing method (2016-02-02),
4. 8865590 - Film forming method, pretreatment device, and processing system (2014-10-21),
5. 8765221 - Film forming method and film forming apparatus (2014-07-01),
6. 8610353 - Plasma generating apparatus, plasma processing apparatus and plasma processing method (2013-12-17),
7. 8562751 - Dry cleaning method of substrate processing apparatus (2013-10-22),
8. 8551565 - Film forming method and film forming apparatus (2013-10-08),
9. 8354337 - Metal oxide film formation method and apparatus (2013-01-15),
10. 8349725 - Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and storage medium (2013-01-08),
11. 8314004 - Semiconductor device manufacturing method (2012-11-20),
12. 8268396 - Film forming method and apparatus, and storage medium (2012-09-18),
13. 8247321 - Method of manufacturing semiconductor device, semiconductor device, electronic instrument, semiconductor manufacturing apparatus, and storage medium (2012-08-21),
14. 8242015 - Film forming method and film forming apparatus (2012-08-14),
15. 8124492 - Semiconductor device manufacturing method (2012-02-28),

Title: Hitoshi Itoh: Innovator in Microwave and Plasma Processing Technologies

Introduction

Hitoshi Itoh is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the fields of microwave supply apparatus and plasma processing technologies. With a total of 18 patents to his name, Itoh's work has had a substantial impact on various technological advancements.

Latest Patents

Among his latest patents are the microwave supply apparatus, plasma processing apparatus, and plasma processing method. The microwave supply apparatus features a waveguide, a circulator, and a matcher, where the first port of the circulator receives a microwave from an input end. The waveguide includes a rectangular design with specific wall configurations and a slot hole that enhances its functionality. Additionally, his film forming method involves a multi-step process that includes forming a thin film, oxidizing it, and then applying a second thin film, showcasing his innovative approach to material processing.

Career Highlights

Hitoshi Itoh has worked with notable organizations such as Tokyo Electron Limited and Tohoku University. His experience in these institutions has allowed him to refine his skills and contribute to cutting-edge research and development in his field.

Collaborations

Itoh has collaborated with esteemed colleagues, including Hiroshi Sato and Hidenori Miyoshi. These partnerships have fostered a collaborative environment that has led to further innovations and advancements in technology.

Conclusion

Hitoshi Itoh's contributions to microwave and plasma processing technologies exemplify his dedication to innovation. His extensive patent portfolio and collaborative efforts highlight his role as a leading inventor in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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