The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2012

Filed:

Dec. 04, 2009
Applicants:

Kenji Matsumoto, Nirasaki, JP;

Hitoshi Itoh, Nirasaki, JP;

Koji Neishi, Sendai, JP;

Junichi Koike, Sendai, JP;

Inventors:

Kenji Matsumoto, Nirasaki, JP;

Hitoshi Itoh, Nirasaki, JP;

Koji Neishi, Sendai, JP;

Junichi Koike, Sendai, JP;

Assignees:

Tokyo Electron Limited, Tokyo, JP;

Tohoku University, Sendai-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract

On a surface of an object to be treated, a Mn-containing thin film or CuMn-containing alloy thin film is formed by heat treatment (CVD or ALD) by using a Mn-containing source gas (or Mn-containing source gas and a Cu-containing gas) and an oxygen-containing gas (for instance, water vapor) as a processing gas. The Mn-containing thin film or the CuMn-containing alloy thin film can be formed with high step coverage in a fine recess formed on the surface of the object to be treated.


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