Koji Neishi

Title: Koji Neishi: Innovator in Semiconductor Technology

Introduction

Koji Neishi is a prominent inventor based in Sendai, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His innovative approaches have advanced the methods of forming semiconductor films, which are crucial for various electronic applications.

Latest Patents

One of Neishi's latest patents is a method of forming a nitride semiconductor film. This method involves intermittently sputtering a target of gallium nitride inside a vacuum chamber containing nitrogen and argon. The sputtered particles of gallium nitride are deposited on a substrate maintained at a temperature between 560 degrees C. and 650 degrees C. The process ensures that the ratio of the flow rate of nitrogen to the total flow rate of nitrogen and argon is maintained between 6% and 18%.

Another notable patent is related to a film forming method, pretreatment device, and processing system. This method focuses on forming a thin film comprising manganese on an object that has an insulating layer made of a low-k film with a recess. The process includes a hydrophilization step to make the surface hydrophilic, followed by a thin-film formation step using a manganese-containing material gas. This innovative approach effectively creates a thin film, such as an MnOx film, on the insulating layer.

Career Highlights

Throughout his career, Koji Neishi has worked with notable organizations, including Tokyo Electron Limited and Tohoku University. His experience in these institutions has allowed him to refine his expertise in semiconductor technology and contribute to groundbreaking advancements in the field.

Collaborations

Neishi has collaborated with various professionals, including his coworker Junichi Koike. Their joint efforts have further propelled innovations in semiconductor film technologies.

Conclusion

Koji Neishi's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in electronic materials and processes.